SEMICONDUCTOR DESIGN
Design flowProcessLithographyPackaging & HBMFlagship chipsYield & costResearchGlossarySources
The state of the art · November 2026

How the world's most advanced chips are designed

From a line of Verilog to a 336-billion-transistor AI accelerator: the 2 nm transistors now in volume production, the lithography that prints them, the packaging that stitches dies and memory together, and the research in Nature and on arXiv that points to what comes next.

300 mm wafer · hover a die
2 nmTSMC N2 in high-volume manufacturing since Q4 2025, the first nanosheet (GAA) node at TSMC
336 Btransistors reported for NVIDIA's Rubin GPU, two reticle-sized compute dies
2,048bit-wide interface per HBM4 stack, double HBM3E, with a logic-process base die
5.5×reticle-size CoWoS interposers in production; 14× planned for 2028
01 · Design flow

From specification to silicon

A modern chip passes through roughly a dozen stages, each with its own tools and teams. Pick a stage to see what happens there, which tools do the work, and where AI is starting to help.

02 · Process technology

The transistor, rebuilt every few years

The FinFET carried the industry from 22 nm to 3 nm. At 2 nm the gate now wraps the channel on all four sides (gate-all-around nanosheets), power is moving to the back of the wafer, and the roadmap continues with stacked CFETs and 2D-material channels.

Leading-edge logic nodes

NodeCompanyTransistorPower deliveryStatus (Nov 2026)Claimed gain
N3PTSMCFinFETFront sideVolume; Apple A19 / M5 generationOptimised 3 nm
N2TSMCGAA nanosheetFront sideHVM since Q4 2025; ~8% of wafer revenue in Q3 2026First TSMC GAA node
N2PTSMCGAA nanosheetFront side2026 ramp~5% over N2 (reported)
A16TSMCGAA nanosheetSuper Power Rail (backside)Development complete; volume Q4 2026 or 2027 (sources differ)8–10% faster or 15–20% less power vs N2P
N2UTSMCGAA nanosheetFront side20283–4% speed or 8–10% power, 1.02–1.03× density vs N2P
A14TSMC2nd-gen GAAFront side (backside version = A12, 2029)2028Up to 15% speed or 30% less power vs N2
A13TSMC2nd-gen GAA—20296% area saving vs A14
18AIntelRibbonFET (GAA)PowerVia (backside)Shipping in Panther Lake since CES 2026; yields improvingFirst commercial backside power
14AIntelRibbonFET 2PowerDirect (backside)Customer decisions 2H 2026–1H 2027; volume ~2028Designed to use High-NA EUV
SF2SamsungMBCFET (GAA)Front side2025–26 rampSamsung's 3rd-gen GAA

"N2", "18A" and the like are marketing names, not physical gate lengths. Compare nodes by measured density, speed and power on the same design. A 2026 teardown of Panther Lake put Intel 18A close to TSMC N3E in density, with newer TSMC nodes still ahead.

Why GAA

Better gate control

Wrapping the gate around stacked silicon sheets suppresses leakage at short channel lengths and lets designers choose sheet width per cell, trading drive current for power.

Why backside power

Wires on both sides

Moving power rails under the transistors frees front-side metal for signals, cuts IR drop and improves density. Intel shipped it first (PowerVia); TSMC follows with Super Power Rail in A16.

What's next

Stack the transistors

imec's 2026 roadmap sees complementary FETs (nMOS on top of pMOS) arriving around the A7 node (~2033), then 2D-material channels, and extends to A3 by 2038.

03 · Lithography

Printing features smaller than a virus

The smallest printable half-pitch follows the Rayleigh criterion, CD = k₁·λ / NA. EUV uses 13.5 nm light; High-NA EUV raises the numerical aperture from 0.33 to 0.55. Intel completed acceptance of ASML's EXE:5200B in late 2025 and is designing 14A around it, while TSMC has so far stayed with 0.33-NA EUV and multi-patterning.

k₁ below ~0.3 needs aggressive resolution-enhancement tricks; the physical limit for a single exposure is 0.25.

—minimum half-pitch, single exposure
—minimum pitch
—depth of focus ≈ λ/NA²
printed lines at this half-pitcha 12 nm reference line
EUV · 0.33 NA

The workhorse

Every leading node since 7 nm uses EUV for its tightest layers. Below ~28 nm pitch, single exposures run out of room and fabs use two or more exposures per layer.

High-NA · 0.55 NA

Bigger lens, half the field

Anamorphic optics shrink the exposure field to half the standard reticle, so dies larger than ~26 × 16.5 mm must be stitched. imec targets qualification of its EXE:5200 by Q4 2026.

The trade-off

Cost per layer

A High-NA scanner costs several hundred million dollars. Whether one exposure beats two cheaper ones decides when each foundry adopts it; analysts expect TSMC around the end of the decade.

04 · Packaging & memory

The package is now part of the chip

A single reticle caps a die at ~830 mm². Today's AI accelerators exceed that by placing several compute dies and up to twelve HBM stacks on a silicon interposer (TSMC CoWoS), or by bonding dies directly on top of each other (SoIC). Memory bandwidth, not raw compute, often sets performance.

Presets: B300 · Rubin · MI455X · Samsung HBM4 max

—package memory bandwidth
—memory capacity
—bandwidth per stack
compute dieHBM stackinterposer
CoWoS

Chip-on-wafer-on-substrate

  • 5.5-reticle interposers in production, with reported yields above 98%
  • 14-reticle version (~10 compute dies, 20 HBM stacks) planned for 2028
  • 40-reticle system-on-wafer (SoW-X) expected in 2029
  • Capacity reported at roughly 130k wafers/month by late 2026 reported
HBM4

A logic die at the bottom of the stack

  • 2,048-bit interface; ~2–3.3 TB/s per stack depending on pin speed
  • Base die now made on a logic process: Samsung in-house 4 nm, SK hynix on TSMC 12 nm
  • Samsung announced mass production in Feb 2026 at 11.7 Gb/s; SK hynix and Micron ramped during 2026
  • 16-high, 48 GB stacks shown at CES 2026
SoIC

True 3D stacking

Hybrid bonding joins dies copper-to-copper with micron-scale pitch. TSMC's A14-on-A14 SoIC (2029) promises 1.8× the die-to-die I/O density of N2-on-N2.

Co-packaged optics

Light leaves from inside the package

TSMC's COUPE photonic engine moves the optical transceiver next to the switch or GPU. TSMC claims 2× power efficiency and 10× lower latency than pluggable optics, with on-substrate production starting in 2026.

05 · Flagship chips

The most advanced chips shipping or announced

Public specifications as of November 2026. Vendor figures use different precisions and sparsity conventions, so compare like with like. Items marked reported come from secondary sources, not the vendor.

NVIDIA · 2026

Rubin GPU

Process
TSMC 3 nm-class, CoWoS-L
Dies
2 reticle-size compute + I/O
Transistors
336 B reported
Memory
288 GB HBM4
Bandwidth
up to 22 TB/s
NVFP4
50 PF inference · 35 PF training
NVLink 6
3.6 TB/s per GPU

72 GPUs and 36 Vera CPUs (88 Olympus cores each) form a Vera Rubin NVL72 rack: 3.6 EF NVFP4. In full production, shipping 2H 2026.

NVIDIA · 2025

Blackwell Ultra (B300)

Process
TSMC 4NP, CoWoS-L
Dies
2 compute dies
Transistors
208 B
Memory
288 GB HBM3E
Bandwidth
8 TB/s
FP4
15 PF dense
Power
~1.4 kW

The current volume workhorse in GB300 NVL72 racks. 1.5× the FP4 throughput of B200.

NVIDIA · 2027

Rubin Ultra

Dies
4 reticle-size compute dies
Memory
~1 TB HBM4E
NVFP4
~100 PF
Rack
Kyber, NVL576

Announced roadmap item; figures are targets. Followed by the Feynman generation.

AMD · 2026

Instinct MI455X

Process
TSMC N2 compute + N3 base dies
Architecture
CDNA 5, 8 compute dies
Transistors
320 B reported
Memory
432 GB HBM4, 12 stacks
Bandwidth
~19.6–23.3 TB/s
FP4
~40 PF

The first AMD GPU on TSMC 2 nm. 72 per Helios rack, with 50% more memory than a Rubin rack.

Google · 2025

TPU v7 Ironwood

Design
Dual-die, inference-first
Memory
192 GB HBM3E
FP8
4,614 TFLOPS
Bandwidth
7.37 TB/s, 8 × HBM3E
Scale
9,216 chips per pod

Google's seventh-generation TPU. Google says AlphaChip-generated floorplans have been used in recent TPU generations.

Intel · 2026

Core Ultra 3 · Panther Lake

Process
Intel 18A compute tile
Transistor
RibbonFET (GAA)
Power
PowerVia backside
Launch
CES 2026

The first commercial chip with backside power delivery. Built at Fab 52 in Arizona; 18A yields still improving through 2026.

Memory capacity per accelerator

GB of HBM on package

Memory bandwidth per accelerator

TB/s, vendor peak figures

Apple's A19 and M5 generation is on TSMC N3P; reports say the next generation (A20, M6) moves to base N2. Rubin bandwidth is 22 TB/s in NVIDIA's developer blog and 19.2 TB/s in one NVIDIA spec table; MI455X bandwidth varies between reports.

06 · Yield & cost

Why big dies are expensive, and chiplets help

A random defect kills the die it lands on, so the fraction of good dies falls exponentially with area. Splitting one large die into chiplets raises yield, at the cost of packaging and die-to-die interfaces. Adjust the sliders to see the trade-off on a 300 mm wafer.

—gross dies per wafer
—die yield
—good dies per wafer
—silicon cost per good chip
yield vs die area at this D₀current design

Dies per wafer = π(d/2)²/A − πd/√(2A) for wafer diameter d. Murphy's model Y = ((1 − e^(−AD₀)) / AD₀)²; Poisson Y = e^(−AD₀). Chiplet cost here covers silicon only, not packaging, testing or the extra area for die-to-die links. Wafer prices for leading nodes are not published; ~$30k for N2 is a widely reported estimate.

07 · Research frontier

What the newest papers say

A selection of peer-reviewed results and preprints from 2024–2026 that point to how chips will be built and designed next. Preprints on arXiv have not been peer reviewed.

2025N2 · 18AGAA nanosheets in volume
2026A16 · 18ABackside power at TSMC
2028A14 · 14A2nd-gen GAA, High-NA at Intel
2029A13 · A12Backside A14 variant
~2033A7 · CFETStacked n/p transistors (imec)
2038+A3 · 2D2D-material channels (imec)
Nature · 2025

A 32-bit RISC-V processor made of 2D semiconductors

A Fudan University team built a processor that runs standard 32-bit RISC-V instructions on 5,900 MoS₂ transistors, with a full standard-cell library for the 2D process. Atom-thin channels keep gate control at lengths where silicon leaks.

Nature 640, 654–661 →
Nature · 2025

2D CMOS processors with thousands of transistors

Two groups integrated complementary 2D logic, pairing n-type MoS₂ and p-type WSe₂ transistors on single chips. A 2026 Nature Communications paper adds wafer-scale, CMOS-compatible MoS₂ transistors with sub-5 nm channels.

Nature News & Views →
Nature · 2025

Photonic processors run real AI models

"Universal photonic artificial intelligence acceleration" reports a silicon-photonics processor (a 128 × 128 photonic core) that runs ResNet, BERT and an Atari reinforcement-learning agent with near-electronic accuracy.

doi:10.1038/s41586-025-08854-x →
Nature · 2021–2024

AlphaChip and the floorplanning debate

Google's reinforcement-learning macro placer, published in 2021 and renamed AlphaChip in a 2024 addendum, has been used on TPU layouts. Critics questioned reproducibility and the use of commercial-tool initial placements; Google's rebuttal is "That Chip Has Sailed".

arXiv:2411.10053 →
arXiv · 2025–2026

LLM agents that write and verify RTL

Benchmarks have moved from single Verilog modules to repository-level tasks. CVDP collects verification and design problems; HORIZON reports completing ChipBench, RTLLM, VerilogEval and nine CVDP categories hands-free, while stressing these are proxies, not solved hardware design.

arXiv:2606.28279 →   CVDP →
arXiv · 2026

Agents for physical design

PDAGENT-BENCH defines 353 tasks across five capability axes for LLM and vision-language agents driving EDA tools in closed loop through placement, routing and timing closure.

arXiv:2606.17253 →
Roadmap · imec 2026

CFET at A7, then 2D

imec places complementary FETs at the A7 node around 2033 and extends its logic roadmap to A3 in 2038, arguing that density gains now come as much from standard-cell height and wiring as from shrinking transistors.

Coverage →
ISSCC · 2026

HBM4 and co-packaged optics in silicon

Samsung's 12-high, 36 GB HBM4 reaches 3.3 TB/s over 2,048 I/O, and NVIDIA and Broadcom presented co-packaged optical switches, signalling that I/O, not logic, is now the critical design frontier for AI systems.

ISSCC 2026 summary →
08 · Glossary

Terms used on this page

Sources

Where the numbers come from

Vendor and foundry figures are claims made by those companies. Roadmap dates move; check the primary source before relying on a date or specification.